M. E. Belousov, E. A. Il'ichev, A. E. Kuleshov, N. K. Matveeva, P. V. Minakov, G. N. Petrukhin, R. M. Nabiev, G. S. Rychkov, “Mask for micropattern formation on diamond films”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 2012, Volume 38, Issue 5,Pages <nobr>49

This article is cited in 4 papers

Mask for micropattern formation on diamond films

M. E. Belousov^ab, E. A. Il'ichev^ab, A. E. Kuleshov^ab, N. K. Matveeva^ab, P. V. Minakov^ab, G. N. Petrukhin^ab, R. M. Nabiev^ab, G. S. Rychkov^ab

^a State Research Institute of Physical Problems
^b Lomonosov Moscow State University, Skobeltsyn Institute of Nuclear Physics

Abstract: A new technology of forming micropatterned masks for the etching of diamond films is proposed, which makes possible high-precision lithography on the samples with areas up to 10$^4$ mm$^2$. A minimum element size that can be achieved is only determined by the level of lithography accessible for silicon-based integrated circuits. The proposed technology can be used in creating unique devices, including biosensor chips for human genome decoding.

Received: 21.06.2011