V. A. Vikulov, V. V. Balashev, T. A. Pisarenko, A. A. Dmitriev, V. V. Korobtsov, “Thin magnetite films on an oxidized silicon surface: Raman spectroscopy study”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 2012, Volume 38, Issue 16,Pages <nobr>87

This article is cited in 4 papers

Thin magnetite films on an oxidized silicon surface: Raman spectroscopy study

V. A. Vikulov^ab, V. V. Balashev^ab, T. A. Pisarenko^ab, A. A. Dmitriev^ab, V. V. Korobtsov^ab

^a Institute for Automation and Control Processes, Far Eastern Branch of the Russian Academy of Sciences, Vladivostok
^b School of Natural Sciences, Far Eastern Federal University, Vladivostok

Abstract: Polycrystalline films of magnetite (Fe$_3$O$_4$) formed by the reactive sputtering of iron in oxygen on Si(001) substrates covered by thin (1.4 nm) or thick (1200 nm) SiO$_2$ layers have been studied by Raman spectroscopy. It is established that (i) the $\alpha$-Fe$_2$O$_3$ phase is formed due to the laser-induced heating in magnetite films synthesized on thick SiO$_2$ layers and (ii) the formation of $\alpha$-Fe$_2$O$_3$ phase depends on the thickness of the buffer SiO$_2$ layer.

Received: 14.03.2012