Equirate magnetron sputtering of mosaic copper-graphite targets

Based on experimental data on sputtering of copper-graphite cathodes, we propose a mechanism of equirate sputtering of elements of mosaic targets prepared from materials the sputtering yields of which differ by almost an order of magnitude. The mechanism takes into account the occurrence of a height discontinuity between the mosaic elements at the initial stage of sputtering, the redistribution of ion fluxes between the elements, and the effects related to the mass transfer in plasma and the implantation of sputtered atoms into the mosaic elements of the different variety.