Energy dependence of aluminum diffusion in $\alpha$-Fe under ion irradiation

The process of diffusion in the film-substrate system irradiated by Ar$^+$ ions of various energies is considered. Data on the ion-bombardment-induced variation of the composition of surface layers at the film-substrate interface are presented. Possible mechanisms of the mutual diffusion and anomalously deep intermixing of components caused by the ion implantation are analyzed.