RUS  ENG
Full version
JOURNALS // Pisma v Zhurnal Tekhnicheskoi Fiziki // Archive

Pisma v Zhurnal Tekhnicheskoi Fiziki, 2010 Volume 36, Issue 18, Pages 60–66 (Mi pjtf9624)

This article is cited in 1 paper

Deposition of YBCO films on both sides of substrate by magnetron sputtering

N. V. Vostokov, Yu. N. Drozdov, D. V. Masterov, S. A. Pavlov, A. E. Parafin

Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod

Abstract: We have studied features of the formation of YBa$_2$Cu$_3$O$_{7-\delta}$ (YBCO) films on both sides of sub-strates by magnetron sputtering in the on-axis geometry. During sputter deposition onto the first (front) side, a thin film is simultaneously formed on the second (rear) side, which can provide a high-quality sublayer for the final coating of preset thickness deposited at the subsequent stage. It is shown that, by monitoring the properties of a sublayer formed on the rear side of substrate during YBCO layer growth on the front side, it is possible to optimize technological parameters of the process.

Received: 29.01.2010


 English version:
Technical Physics Letters, 2010, 36:9, 859–861

Bibliographic databases:


© Steklov Math. Inst. of RAS, 2026