Silicon surface structuring by glow discharge plasma

The possibility of changing the morphology of the silicon surface at certain parameters of the glow discharge is shown. It has been established that oxidation is the main process influencing the surface morphology during glow discharge plasma treatment. As a result of processing in the investigated range of parameters, various stages of the surface oxidation process are observed: the formation of a uniform oxide layer, the formation of nano- and microstructures of silicon oxide. It is shown that these processes lead to surface modification, which acquires stable hydrophilic and superhydrophilic properties.