M. S. Komlenok, B. O. Volodkin, B. A. Knyazev, V. V. Kononenko, T. V. Kononenko, V. I. Konov, V. S. Pavelyev, V. A. Soifer, K. N. Tukmakov, Yu. Yu. Choporova, “Fabrication of a multilevel THz Fresnel lens by femtosecond laser ablation”, Kvantovaya Elektronika, 2015, Volume 45, Number 10,Pages <nobr>933

This article is cited in 33 papers

Laser technologies

Fabrication of a multilevel THz Fresnel lens by femtosecond laser ablation

M. S. Komlenok^ab, B. O. Volodkin^c, B. A. Knyazev^de, V. V. Kononenko^ab, T. V. Kononenko^ab, V. I. Konov^ab, V. S. Pavelyev^cf, V. A. Soifer^fc, K. N. Tukmakov^c, Yu. Yu. Choporova^de

^a A.M. Prokhorov General Physics Institute Russian Academy of Sciences, Moscow
^b Moscow Engineering Physics Institute (National Nuclear Research University)
^c S. P. Korolyov Samara State Aerospace University
^d G I. Budker Institute of Nuclear Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk
^e Novosibirsk State University
^f Image Processing Systems Institute, Samara

Abstract: The possibility of fabricating a silicon diffractive fourlevel THz Fresnel lens by laser ablation is studied. For a microrelief to be formed on the sample surface, use is made of a femtosecond Yb:YAG laser with a high pulse repetition rate (f=200 kHz). Characteristics of the diffractive optical element are investigated in the beam of a 141-mm free-electron laser. The measured diffraction efficiency of the lens is in good agreement with the theoretical estimate.

Keywords: diffraction optics, free-electron lasers, terahertz radiation, laser ablation.

PACS: 07.57.Pt, 42.65.Re, 79.20.Eb, 42.79.Bh

Received: 23.06.2015