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Kvantovaya Elektronika, 2004 Volume 34, Number 2, Pages 95–98 (Mi qe2589)

This article is cited in 7 papers

Lasers

A 223-nm KrCl excimer laser on a He–Kr–HCl mixture

A. M. Razhev, A. A. Zhupikov, E. S. Kargapol'tsev

Institute of Laser Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk

Abstract: The results of experimental studies of the parameters of a 223-nm electric-discharge KrCl excimer laser on a He–Kr–HCl mixture depending on the excitation conditions and the composition of the active gaseous medium are presented. To achieve the maximum values of the output energy and the efficiency of the KrCl laser on mixtures with buffer gaseous helium, an excitation system was used that included a circuit with an LC inverter with a high-voltage switch based on an RU-65 spark gap. An output energy of 320 mJ with an efficiency of 0.5% relative to the energy stored in the capacitors is obtained in a KrCl laser with an active medium based on the buffer He gas at a charging voltage of 30 kV. Radiation pulses with a duration of 22 ± 1 ns and a pulse power of 15 MW are obtained.

PACS: 42.55.Lt, 42.60.Lh

Received: 03.07.2003
Revised: 06.09.2003


 English version:
Quantum Electronics, 2004, 34:2, 95–98

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