S. A. Pikuz, V. M. Romanova, T. A. Shelkovenko, T. A. Pikuz, A. Ya. Faenov, È. Förster, J. Wolf, O. Wehrhan, “Use of higher-order reflection from mica crystals in x-ray spectroscopic investigations at 0.1 — 0.3 nm”, Kvantovaya Elektronika, 1995, Volume 22, Number 1,Pages <nobr>21

This article is cited in 12 papers

Interaction of laser radiation with matter. Laser plasma

Use of higher-order reflection from mica crystals in x-ray spectroscopic investigations at 0.1 — 0.3 nm

S. A. Pikuz^a, V. M. Romanova^a, T. A. Shelkovenko^a, T. A. Pikuz^b, A. Ya. Faenov^c, È. Förster^d, J. Wolf^d, O. Wehrhan^d

^a P. N. Lebedev Physical Institute, Russian Academy of Sciences, Moscow
^b N. E. Bauman Moscow State Technical University
^c Federal State Unitary Enterprise (FSUE) "National Research Institute for Physicotechnical and Radio Engineering Measurements", Mendeleevo, Moscow region
^d X-Ray Optics Group, Max Planck Gesellschaft, Friedrich Schiller University, Germany

Abstract: Crystallographic and dispersion characteristics of mica at high (V — XI) reflection orders were investigated for the first time. Even the order-XI integral reflection was sufficiently strong to be used in experiments. High-precision bending of a mica crystal along a spherical surface with a small radius R = 100 mm and the use of such crystal analysers in focusing spectrographs with one-dimensional and two-dimensional spatial resolution made it possible to record low-intensity spectra of multiply charged ions in laser and Z-pinch plasmas. The method provides exceptional spectral resolution λ/Δλ ≈ 6000 — 10 000 in a wide spectral range (0.15 — 1.8 nm).

PACS: 07.85.+n, 52.25.Nr, 52.50.Jm