I. A. Artyukov, L. L. Balakireva, F. Bijkerk, A. V. Vinogradov, N. N. Zorev, I. V. Kozhevnikov, V. V. Kondratenko, O. F. Ogurtsov, A. G. Ponomarenko, A. I. Fedorenko, “Projection x-ray lithography implemented using point sources”, Kvantovaya Elektronika, 1992, Volume 19, Number 2,Pages <nobr>114

This article is cited in 4 papers

Review

Projection x-ray lithography implemented using point sources

I. A. Artyukov, L. L. Balakireva, F. Bijkerk, A. V. Vinogradov, N. N. Zorev, I. V. Kozhevnikov, V. V. Kondratenko, O. F. Ogurtsov, A. G. Ponomarenko, A. I. Fedorenko

Abstract: An analysis is made of the state of the art of x-ray lithography and x-ray optics. The principles of design and configurations of projection x-ray lithographic systems are considered. An analysis is made of the main trends of research on these topics proceeding in the laboratories in the Soviet Union, USA, Japan, and Great Britain. The problems encountered in the development of multilayer normal-incidence x-ray mirrors are described.

UDC: 778.33:776

PACS: 41.50.+h, 42.82.Cr, 42.79.Bh

Received: 20.06.1991