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JOURNALS // Kvantovaya Elektronika // Archive

Kvantovaya Elektronika, 1983 Volume 10, Number 9, Pages 1914–1916 (Mi qe4696)

This article is cited in 3 papers

Brief Communications

High-optical-strength thin-film interference polarizers for high-power lasers

N. I. Gavrilov, P. P. Pashinin, A. M. Prokhorov, O. M. Prilyuk, S. N. Sergeev, R. V. Serov, Sh. A. Furman, V. P. Yanovskiĭ, V. D. Vvedenskiĭ

P. N. Lebedev Physical Institute, the USSR Academy of Sciences, Moscow

Abstract: Thin-film interference polarizers made of SiO2 and ZrO2 layers were made and investigated. The technology of deposition of the layers is described. The results are reported of an investigation of the optical strength of such polarizers and the mechanism of damage is considered. It is shown that the investigated polarizers are suitable for use in high-power laser systems.

UDC: 621.373.826

PACS: 42.80.Cj, 42.60.-v

Received: 19.11.1982


 English version:
Soviet Journal of Quantum Electronics, 1983, 13:9, 1272–1273

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© Steklov Math. Inst. of RAS, 2024