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Kvantovaya Elektronika, 1981 Volume 8, Number 2, Pages 373–375 (Mi qe5884)

This article is cited in 4 papers

Brief Communications

Lasing as a result of a B–X transition in the excimer XeF formed as a result of photodissociation of KrF2 in mixtures with Xe

V. S. Zuev, I. F. Isaev, A. V. Kanaev, L. D. Mikheev, D. B. Stavrovskiĭ, N. G. Shchepetov


Abstract: An investigation was made of the absorption spectrum of KrF2 in the range 115–190 nm. A structure-free absorption band with a maximum at 162 nmand a half-width of 16 nm was observed. The absorption of light in this band resulted in photodissociation of KrF2 producing excited KrF. Vacuum ultraviolet radiation generated by a high-current discharge was used to excite a KrF2–Xe–N2–Ar gas mixture. This resulted in lasing due to the B(v' = 0)–X(v'' = 3) transition in the XeF excimer (λ = 353 nm).

UDC: 621.375.826+535.341.08+535.37

PACS: 42.55.Ks

Received: 13.08.1980


 English version:
Soviet Journal of Quantum Electronics, 1981, 11:2, 221–222

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© Steklov Math. Inst. of RAS, 2024