RUS  ENG
Full version
JOURNALS // Kvantovaya Elektronika // Archive

Kvantovaya Elektronika, 1982 Volume 9, Number 11, Pages 2329–2330 (Mi qe6179)

This article is cited in 2 papers

Brief Communications

Fabrication and investigation of thin-film CdSxSe1–x waveguides

Z. È. Buachidze, I. V. Vasilishcheva, V. N. Morozov, V. A. Pletnev, A. S. Semenov, P. V. Shapkin


Abstract: The diffusion method was used to fabricate CdSxSe1–x solid-solution waveguides with losses in the range 9–13 dB/cm. The refractive index profile of these waveguides was determined. Photochemical etching of the waveguide surface was employed to form diffraction gratings with 103 lines/mm and a relief 40-nm deep.

UDC: 621.372.8.029.7

PACS: 42.80.Lt, 42.80.Fn

Received: 25.06.1982


 English version:
Soviet Journal of Quantum Electronics, 1982, 12:11, 1514–1516

Bibliographic databases:


© Steklov Math. Inst. of RAS, 2024