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JOURNALS // Kvantovaya Elektronika // Archive

Kvantovaya Elektronika, 1986 Volume 13, Number 8, Pages 1730–1733 (Mi qe7360)

This article is cited in 4 papers

Brief Communications

Electron-beam-excited ArF laser

A. D. Klementov, N. V. Morozov, P. B. Sergeev


Abstract: An experimental investigation was made of an electron-beam-excited ArF laser. The concentration of the active gas mixture was optimized, and lasing and luminescence spectra of the active medium were obtained. A lasing energy of 3.5 J and an efficiency of 3.5% were achieved using an Ne–Ar-F2 active gas mixture at a pressure of 6 atm. A proposed system of plasma-chemical processes in the active medium of an electron-beam-excited ArF laser is used to analyze the results and draw conclusions on the potential applications of this laser and the conditions for their implementation.

UDC: 621.373.826.038.823

PACS: 42.55.Lt, 42.60.By, 42.60.Lh, 42.60.Jf

Received: 12.11.1985


 English version:
Soviet Journal of Quantum Electronics, 1986, 16:8, 1139–1142

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© Steklov Math. Inst. of RAS, 2024