Abstract:
The characteristic features of the use of pulsed ultraviolet lasers in photolithography were studied, including the high pulse power and monochromaticity of laser radiation. An experimental study was made of the photolithographic process carried out using a pulsed nitrogen laser emitting at λ = 337 nm. Structures of (1.2–1.3)λ size were formed in FP-617 photoresist.
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