Kinetics of a gas-discharge XeF excimer laser

An investigation is made of the kinetics of evolution of a pulsed discharge and accumulation of excited XeF* excimers in an He–Xe–NF₃ mixture. A kinetic model is proposed for a pulsed gas-discharge laser. This can be used to predict the optimal mixture pressure and pulse duration and to estimate the excited excimer concentrations attainable under optimal pulsed discharge conditions.