Raising the accuracy of monitoring the optical coating deposition by application of a nonlocal algorithm of data analysis

Under consideration is the inverse problem of controlling the deposition of a multilayer coating using optical monitoring. Some new nonlocal algorithm is introduced for data analysis. Using the simulation of deposition process, the errors are compared of the proposed nonlocal algorithm and the traditional local algorithm. A scheme of correction of the levels of the deposition process termination is considered which allows us to improve the accuracy of deposition monitoring. We show that the introduced nonlocal algorithm is more efficient both for the deposition without correction of the signal level for the deposition interruption and with correction of this level.