Influence of addition of $\mathrm{Ar}$ and $\mathrm{He}$ on the $\mathrm{HCl}$ plasma parameters and composition

The influence of the initial $\mathrm{HCl}$-$\mathrm{Ar}$ and $\mathrm{HCl}$-$\mathrm{He}$ mixture composition on the DC glow discharge plasma at $p=40$–$200$ Pa and $i_p=15$–$35$ mA is investigated. Model calculations are performed, and the electron distributions over energy, integral characteristics of the electron gas, and the charged particle concentrations are obtained. We show that the main influence of the initial mixture composition on the active particle concentrations is caused by variation of the process kinetics under the impact of electrons.