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JOURNALS
// Teplofizika vysokikh temperatur
// Archive
TVT,
1995
Volume 33,
Issue 1,
Pages
163–166
(Mi tvt2896)
This article is cited in
1
paper
Short Communications
Deposition of thin films during thermal vaporization of aluminum nitride in a vacuum
A. V. Kostanovskii
,
M. K. Gusev
Institute for High Temperatures, Russian Academy of Sciences, Moscow
UDC:
546.621.171.539.216
Received:
04.03.1994
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English version:
High Temperature, 1995,
33
:1,
162–164
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