Abstract:
The results are presented of the simultaneous measurements of the integral hemispherical emissivity, $\varepsilon_{\mathrm{th}}$, and electrical resistance, $\rho$, of model alloys of titanium doped by aluminum and vanadium. The aluminum content in the solid solutions of the $\mathrm{Ti}$–$\mathrm{Al}$ system didn't exceed $10.5\%$ (at.). Adding of vanadium as the second dopant to the same materials was within $2$–$3\%$ (at.).
The experimental data on $\varepsilon_{\mathrm{th}}$ are presented for the temperature range of $700$–$1700$ K and on $\rho$, for $77$–$1700$ K. The experimental results show that it is impossible to establish any mutual correlation between the volumetric and the surface properties of the alloys investigated.