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JOURNALS // Teplofizika vysokikh temperatur // Archive

TVT, 2017 Volume 55, Issue 2, Pages 189–196 (Mi tvt9885)

This article is cited in 3 papers

Plasma Investigations

The kinetic model of al oxidation in heterogeneous aluminum-water plasma. Negative ions

O. V. Korshunov, V. F. Chinnov, D. I. Kavyrshin

Joint Institute for High Temperatures, Russian Academy of Sciences, Moscow

Abstract: We investigate the mechanisms of formation and death of negative ions in aluminum-water plasma, their role in kinetics of its ionization and recombination, and influence on plasma parameters. Negative ions, in contrast to the positive, do not in fact participate in the heterogeneous processes and require, to enhance their influence on the plasma parameters, first, high electron temperatures $(\sim 1.5$ eV and higher$)$ and, second, low $n_e$ and $[\rm Al]$ concentrations: in this way, they make a great contribution to the $\rm H_2O$ dissociation at the expense of the electron energy $(2$$8$ electrons per a molecule$)$. We show that, even in the most favorable conditions – at low $\rm H$ and $\rm O$ concentrations within the experimental temperature range, $T_e = 0.6$$1$ eV, – the negative ions do not, in fact, influence the $\rm Al$ concentration and, in the operation reactor zone, the other parameters, except for the microparticle concentration. We reveal the source, important for the spectral diagnostics of the atomic emission, of recombination populating of the excited $\rm Al$ levels. We have concluded the impossibility of its use in order to optimize the operation of the aluminum-water plasma-chemical reactor.

UDC: 533.92

Received: 03.03.2015
Accepted: 13.10.2015

DOI: 10.7868/S0040364417020065


 English version:
High Temperature, 2017, 55:2, 183–190

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