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UFN, 2004 Volume 174, Number 3, Pages 259–283 (Mi ufn23)

This article is cited in 21 papers

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Investigation of semiconductors with defects using Raman scattering

L. A. Falkovsky

L. D. Landau Institute for Theoretical Physics, Russian Academy of Sciences

Abstract: The influence of defects and carriers on lattice dynamics, especially on Raman scattering from semiconductors and metals, is considered; a comparison of the theory with experimental data is made. Phonon scattering by point, line, and plane defects produces a phonon shift and phonon broadening, which influence the Raman line shape. This effect is used for investigating strain at interfaces and for characterizing semiconductor devices. Phonon interaction with carriers involves a Coulomb field excited by optical-phonon vibrations. Our treatment of the electron–phonon interaction is based on the Born–Oppenheimer adiabatic approximation. The effect of carriers is essential near the edge of the $\omega$$k$ region where Landau damping appears due to the electron–hole excitation. A possibility to determine the electron–phonon coupling constant from experiments with the phonon–plasmon coupled modes is discussed.

PACS: 63.20.-e, 63.20.Dj, 78.30.-j

Received: September 1, 2003

DOI: 10.3367/UFNr.0174.200403b.0259


 English version:
Physics–Uspekhi, 2004, 47:3, 249–272

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