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JOURNALS // Uspekhi Fizicheskikh Nauk // Archive

UFN, 2017 Volume 187, Number 9, Pages 971–979 (Mi ufn5783)

This article is cited in 9 papers

REVIEWS OF TOPICAL PROBLEMS

Hot electrons in silicon oxide

V. A. Gritsenkoabc

a Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, Novosibirsk
b Novosibirsk State University
c Novosibirsk State Technical University

Abstract: One particular application of amorphous silicon oxide ${\rm SiO_2}$, a material crucial for silicon device technology and design, is as a flash memory tunnel dielectric. The breakdown field of ${\rm SiO}_2$ exceeds $10^7$ V $\rm cm^{-1}$. Strong electric fields in ${\rm SiO}_2$ give rise to phenomena that do not occur in crystalline semiconductors. In relatively weak electric fields ($10^4 - 10^6$ V $\rm cm^{-1}$) the electron distribution function is determined by the scattering of electrons on longitudinal optical phonons. In high fields (in excess of $10^6$ V $\rm cm^{-1}$), the distribution function is determined by electron–acoustic phonon scattering.

PACS: 72.20.Ht, 72.20.Jv, 72.80.Sk, 73.40.Sx

Received: September 2, 2016
Revised: December 7, 2016
Accepted: December 8, 2016

DOI: 10.3367/UFNr.2016.12.038008


 English version:
Physics–Uspekhi, 2017, 60:9, 902–910

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