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JOURNALS // Uspekhi Fizicheskikh Nauk // Archive
UFN, 2019 Volume 189, Number 3, Pages 323–334 (Mi ufn6375)
This article is cited in 18 papers

CONFERENCES AND SYMPOSIA

Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences)

D. B. Abramenkoab, P. S. Antsiferova, D. I. Astakhovac, A. Yu. Vinokhodovb, I. Yu. Vichevd, R. R. Gayazova, A. S. Grushind, L. A. Dorokhina, V. V. Ivanovab, D. A. Kimd, K. N. Koshelevab, P. V. Krainove, M. S. Krivokorytovabe, V. M. Krivtsunabe, B. V. Lakatoshe, A. A. Lashb, V. V. Medvedevace, A. N. Ryabtseva, Yu. V. Sidelnikova, E. P. Snegireva, A. D. Solomyannayad, M. V. Spiridonovfb, I. P. Tsygvintsevd, O. F. Yakushevg, A. A. Yakushkinb

a Institute of Spectroscopy, Russian Academy of Sciences, Troitsk, Moscow
b EUV Labs, Ltd., Troitsk, Moscow
c ISTEQ B.V., Eindhoven, Netherlands
d Keldysh Institute of Applied Mathematics, Russian Academy of Sciences, Moscow
e Moscow Institute of Physics and Technology (State University), Dolgoprudny, Moscow region
f Prokhorov General Physics Institute, Russian Academy of Sciences, Moscow
g Lebedev Physical Institute, Russian Academy of Sciences, Moscow

Abstract: We report on the development of plasma-based sources of extreme ultraviolet radiation for the next-generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.

PACS: 42.82.Cr, 52.25.Os, 52.59.-f, 52.70.-m, 52.77.-j

Received: August 28, 2018
Accepted: June 20, 2018

DOI: 10.3367/UFNr.2018.06.038447


 English version: Physics–Uspekhi, 2019, 62:3, 304–314

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