RUS  ENG
Full version
JOURNALS // Uspekhi Fizicheskikh Nauk // Archive

UFN, 2019 Volume 189, Number 8, Pages 803–848 (Mi ufn6380)

This article is cited in 15 papers

REVIEWS OF TOPICAL PROBLEMS

SiC-based electronics (100th anniversary of the Ioffe Institute)

A. A. Lebedev, P. A. Ivanov, M. E. Levinshtein, E. N. Mokhov, S. S. Nagalyuk, A. N. Anisimov, P. G. Baranov

Ioffe Institute, St. Petersburg

Abstract: We review the history and modern state of silicon carbide and SiC-based devices. The main techniques for growing bulk SiC crystals and epitaxial SiC films are discussed. Epitaxial SiC structures used for post-growth processing are briefly reviewed. The state of the art achieved in developing SiC devices is presented. The main problems that occur in developing SiC equipment and prospects for designing and developing such equipment are analyzed.

PACS: 81.05.ue, 81.10.-h, 85.30.-z

Received: September 4, 2018
Revised: October 1, 2018
Accepted: October 4, 2018

DOI: 10.3367/UFNr.2018.10.038437


 English version:
Physics–Uspekhi, 2019, 62:8, 754–794

Bibliographic databases:


© Steklov Math. Inst. of RAS, 2024