Abstract:
This work is devoted to determine the threshold value of ionization energy loss $S_{et}$ for formation of latent tracks in polycrystalline silicon nitride based on the analysis of radiation-stimulated amorphization of material. Si$_3$N$_4$ (Al) specimens were irradiated with 167 MeV and 220 MeV Xe ions with high fluencies (6$\times$10$^{14}$ and 2$\times$10$^{14}$ cm$^{-2}$, respectively). According to cross-section TEM analysis of sample structures the lower boundary of $S_{et}$ has been found at level 6.7 keV/nm.