Abstract:
The paper is concerned with solving some inverse synthesis problems for nano-optical flat elements. The methods developed allow one to form the fairly arbitrary directional diagrams of such elements. The unique capabilities of nano-optics open a wide range of its applications. Now this technology is already used to protect various documents against counterfeiting.
Keywords:nano-optics; electron beam lithography; multilevel microrelief; flat optical element; holographic optical element (HOE); diffractive optical element (DOE); inverse problems.
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