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JOURNALS // Zhurnal Tekhnicheskoi Fiziki

Zhurnal Tekhnicheskoi Fiziki, 2018, Volume 88, Issue 8, Pages 1264–1272 (Mi jtf5851)

Analytical model for atomic-layer deposition of thin films on the walls of cylindrical holes with a relatively high aspect ratio
A. V. Fadeev, K. V. Rudenko

This publication is cited in the following articles:
  1. A. A. Malygin, A. A. Malkov, E. A. Sosnov, “Aleskovskii's Leading Scientific School “Chemistry of Highly Organized Substances:” from Fundamental Research to Widespread Practical Implementation”, Russ. J. Inorg. Chem., 2024  crossref
  2. A. A. Malygin, A. A. Malkov, E. A. Sosnov, “V.B. Aleskovskii's Leading Scientific Highly Organized Substance Chemistry School: from Fundamental Research to Widespread Practical Implementation”, Žurnal neorganičeskoj himii, 69:3 (2024), 294  crossref
  3. V.Yu. Vasilev, “KONFORMNOST ROSTA TONKIKh SLOEV IZ GAZOVOI FAZY NA RELEFNYKh MIKRO- I NANOSTRUKTURAKh. Chast 3. Protsessy atomno-sloevogo osazhdeniya, “Elektronnaya tekhnika. Seriya 3. Mikroelektronika””, Elektronnaya tekhnika. Seriya 3. Mikroelektronika, 2020, no. 3, 26  crossref


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