Influence of addition of $\mathrm{Ar}$ and $\mathrm{He}$ on the $\mathrm{HCl}$ plasma parameters and composition
A. M. Efremov, A. V. Yudina, V. I. Svetsov

This publication is cited in the following articles:

1. A. M. Efremov, O. A. Semenova, S. M. Barinov, “Influence of the initial composition of a methane–argon mixture on electrophysical parameters and plasma composition of DC glow discharge”, High Temperature, 53:2 (2015), 171–178            
2. Efremov A.M. Murin D.B., “Kinetics of Heterogeneous Decay of Chlorine and Hydrogen Atoms in Plasmas of Hcl Binary Mixtures With Ar, H-2, O-2, and Cl-2”, High Energy Chem., 49:4 (2015), 282–285    
3. A. M. Efremov, D. B. Murin, “Parameters of plasma and mechanisms of etching of metals and semiconductors in HCl + Ar, H2, O2, and Cl2 mixtures”, Russ Microelectron, 44:5 (2015), 297  
4. A. Yu. Gavrilova, A. G. Kiselev, E. P. Skorokhod, “Meta-Equilibrium Phase Diagrams of Heavy Inert Gases”, High Temperature, 52:2 (2014), 157–168            
5. O. A. Semenova, A. M. Efremov, S. M. Barinov, V. I. Svettsov, “Kinetics and Concentration of Active Particles in Nonequilibrium Low Temperature Methane Plasma”, High Temperature, 52:3 (2014), 348–355            
6. A. M. Efremov, A. A. Davlyatshina, V. I. Svetsov, “Electrophysical parameters and composition of $\mathrm{HCl}$–$\mathrm{N}_2$ mixture plasmas”, High Temperature, 51:1 (2013), 1–6          
7. V. A. Shakhatov, T. B. Mavlyudov, Yu. A. Lebedev, “Studies of the distribution functions of molecular nitrogen and its ion over the vibrational and rotational levels in the dc glow discharge and the microwave discharge in a nitrogen-hydrogen mixture by the emission spectroscopy technique”, High Temperature, 51:4 (2013), 551–565            
8. Murin D.B., Efremov A.M., Svettsov V.I., Pivovarenok S.A., Ovtsyn A.A., Shabadarov S.S., “Intensivnosti izlucheniya i kontsentratsii aktivnykh chastits v plazme tleyuschego razryada v smesyakh khloristogo vodoroda s argonom i geliem”, Izvestiya vysshikh uchebnykh zavedenii. Seriya: khimiya i khimicheskaya tekhnologiya, 56:4 (2013), 29–32    
9. Dunaev A.V., Pivovarenok S.A., Efremov A.M., Svettsov V.I., Kapinos S.P., Yudina A.V., “Parametry plazmy i mekhanizmy plazmokhimicheskogo travleniya GaAs v smesyakh HCl s argonom i khlorom”, Mikroelektronika, 42:4 (2013), 271–271    
10. A. V. Dunaev, S. A. Pivovarenok, A. M. Efremov, V. I. Svettsov, S. P. Kapinos, A. V. Yudina, “Plasma parameters and mechanisms of GaAs reactive plasma etching in mixtures of HCl with argon and chlorine”, Russ Microelectron, 42:4 (2013), 212