|
|
|
|
References
|
|
| |
| 1. |
R. Buss, J. Babu, J. Vac. Sci. Technology A, 14 (1996), 577   |
| 2. |
Y. Watanabe, M. Shiratani, Plasma Sources Sci. Technology, 3 (1994), 286 |
| 3. |
Y. Hayashi, K. Tachibana, Jpn. Apply Physics, 33 (1994), L809 |
| 4. |
J. H. Chu, I. Lin, Physical Review Letters, 72:25 (1994), 4009 |
| 5. |
H. Thomas, G. E. Morfill, V. Demmel and others, Physical Review Letters, 73:5 (1994), 652 |
| 6. |
T. Trottenberg, A. Melzer, A. Pill, Plasma Sources Sci. Technology, 4 (1994), 450 |
| 7. |
V. E. Fortov, A. P. Nefedov, V. M. Torchinski and others, Physics Letters A, 229 (1997), 317 |
| 8. |
A. D. Khahaev, L. A. Luisova, A. A. Piskunov etc., XVI International Conference Gas Discharges and their Applications, v. 1, Xiam, China, 2006, 341 |
| 9. |
V. I. Sysun, A. D. Khakhaev, O. V. Oleschuk, A. S. Shelestov, Fizika plazmy, 31:9 (2005), 834 |
| 10. |
J. P. Baeuf, Physical Review A, 46:12 (1992), 7910 |
| 11. |
A. V. Zobnin, A. P. Nefedov, V. A. Sinelschikov, V. E. Fortov, ZhETF, 118:3(9) (2000), 554 |
| 12. |
O. S. Vaulina, A. Yu. Repin, O. F. Petrov, Fizika plazmy, 32:6 (2006), 528 |
