Publications in Math-Net.Ru
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Nanophotonic structure formation by dry e-beam etching of the resist: resolution limitation origins
Computer Optics, 41:4 (2017), 499–503
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Some peculiarities of a new method of microrelief creation by the direct electron-beam etching of resist
Computer Optics, 39:2 (2015), 204–210
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The Radiation Polymerisation of Monomers Adsorbed on Solid Surfaces
Usp. Khim., 56:1 (1987), 148–174
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Some problems presented by the radiation polymerization and copolymerization of tetrafluoroethylene in the solid state
Dokl. Akad. Nauk SSSR, 157:6 (1964), 1399–1402
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Radiation polymerization of tetrafluoroethylene in the solid state
Dokl. Akad. Nauk SSSR, 149:6 (1963), 1322–1325
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