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Bruk Mark Avramovich

Publications in Math-Net.Ru

  1. Nanophotonic structure formation by dry e-beam etching of the resist: resolution limitation origins

    Computer Optics, 41:4 (2017),  499–503
  2. Some peculiarities of a new method of microrelief creation by the direct electron-beam etching of resist

    Computer Optics, 39:2 (2015),  204–210
  3. The Radiation Polymerisation of Monomers Adsorbed on Solid Surfaces

    Usp. Khim., 56:1 (1987),  148–174
  4. Some problems presented by the radiation polymerization and copolymerization of tetrafluoroethylene in the solid state

    Dokl. Akad. Nauk SSSR, 157:6 (1964),  1399–1402
  5. Radiation polymerization of tetrafluoroethylene in the solid state

    Dokl. Akad. Nauk SSSR, 149:6 (1963),  1322–1325


© Steklov Math. Inst. of RAS, 2024