Publications in Math-Net.Ru
-
USE OF ASYMMETRIC EXPOSURES IN PLANAR WAVE X-RAY TOPOGRAPHY FOR THE
STUDY OF MICRODEFECTS IN SILICON-CRYSTALS
Zhurnal Tekhnicheskoi Fiziki, 62:4 (1992), 171–175
-
Experimental study and computer simulation of high temperature dislocation images in X-ray section topograms in $\mathrm{Si}$
Fizika Tverdogo Tela, 29:5 (1987), 1392–1398
-
Direct measurement of the parameters of x-ray dynamic scattering by silicon crystals at elevated temperatures
Fizika Tverdogo Tela, 28:9 (1986), 2597–2603
-
Vicinal sectoriality and its relation to ADP crystal growth kinetics
Dokl. Akad. Nauk SSSR, 278:2 (1984), 358–361
-
Realization of the dislocation free growth of ADP crystals under the X-ray topography control in situ
Dokl. Akad. Nauk SSSR, 260:4 (1981), 864–867
-
Investigation of the growth kinetics of ADP crystals from solution by the “in-situ” method fo X-ray topography
Dokl. Akad. Nauk SSSR, 248:2 (1979), 356–358
© , 2024