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Publications in Math-Net.Ru
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Некоторые эффекты, влияющие на профиль распределения внедренных ионов
в кристаллических мишенях полупроводниковых соединений
A$^{\text{III}}$B$^{\text{V}}$ после ионной имплантации
Fizika i Tekhnika Poluprovodnikov, 25:3 (1991), 373–378
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APPLICATION OF HIGH-RESOLUTION SPECTROSCOPY OF ELASTIC REFLECTION FOR
STUDYING THE DIFFRACTION EFFECTS DURING INTERACTION OF FAST ELECTRONS
WITH MONOCRYSTALS
Pisma v Zhurnal Tekhnicheskoi Fiziki, 17:7 (1991), 10–12
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ELECTRONIC ANALOGS OF THE TECHNIQUE OF BACK SCATTERING OF FAST IONS FOR
INVESTIGATION OF DEFECT DEPTH PROFILES IN MONOCRYSTALS
Pisma v Zhurnal Tekhnicheskoi Fiziki, 15:17 (1989), 30–33
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Determination of chemical-composition of compounds on power spectra of fast electron elastic reflection
Pisma v Zhurnal Tekhnicheskoi Fiziki, 13:17 (1987), 1043–1047
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Effect of Surface Dissociation on the Properties of Ionically Implanted Silicon-Carbide $p$-Type Layers
Fizika i Tekhnika Poluprovodnikov, 20:1 (1986), 170–172
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Influence of non-centrisymmetric crystal-lattice on electron channeling
Pisma v Zhurnal Tekhnicheskoi Fiziki, 12:8 (1986), 501–505
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Study of the Effect of Silicon-Carbide Ion Implantation and
Annealing Modes on Crystal Structure and Resistance of $p$-Type
Layers
Fizika i Tekhnika Poluprovodnikov, 18:6 (1984), 1098–1100
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Thermoelastic Stress in Silicon Annealed by Millisecond Pulses
Fizika i Tekhnika Poluprovodnikov, 18:4 (1984), 747–750
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