Publications in Math-Net.Ru
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Calculating silicon-amorphization doses under medium-energy light-ion irradiation
Fizika i Tekhnika Poluprovodnikov, 54:8 (2020), 771–777
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Impact of oxygen vacancies on the formation and structure of filaments in SiO$_2$-based memristors
Pisma v Zhurnal Tekhnicheskoi Fiziki, 46:1 (2020), 24–27
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Calculation of the influence of the ion current density and temperature on the accumulation kinetics of point defects under the irradiation of Si with light ions
Fizika i Tekhnika Poluprovodnikov, 52:9 (2018), 967–972
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Defect interaction in the phosphorus diffusion in silicon
Fizika Tverdogo Tela, 28:10 (1986), 3226–3228
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Pressure effect on recrystallization rate of amorphous silicon layer at postimplantation annealing
Fizika Tverdogo Tela, 27:1 (1985), 274–277
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