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Publications in Math-Net.Ru
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Latent accumulation of surface states in MOS structures after exposure to ionizing radiation
Fizika i Tekhnika Poluprovodnikov, 55:7 (2021), 559–563
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The effect of the ionizing radiation intensity on the response of MOS structures
Fizika i Tekhnika Poluprovodnikov, 55:2 (2021), 152–158
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Dispersive transport of hydrogen in MOS structures after exposure to ionizing radiation
Fizika i Tekhnika Poluprovodnikov, 54:10 (2020), 1029–1033
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Model of the effect of the gate bias on MOS structures under ionizing radiation
Fizika i Tekhnika Poluprovodnikov, 54:2 (2020), 189–194
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Model of the negative-bias temperature instability of $p$-MOS transistors
Fizika i Tekhnika Poluprovodnikov, 54:2 (2020), 181–188
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Influence of annealing temperature on electrically active centers in silicon implanted with germanium ions
Fizika i Tekhnika Poluprovodnikov, 53:2 (2019), 161–164
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Charge accumulation in MOS structures with a polysilicon gate under tunnel injection
Fizika i Tekhnika Poluprovodnikov, 52:13 (2018), 1625–1630
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Model for charge accumulation in $n$- and $p$-MOS transistors during tunneling electron injection from a gate
Fizika i Tekhnika Poluprovodnikov, 52:6 (2018), 637–642
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Influence of traps in silicon dioxide on the breakdown of MOS structures
Fizika i Tekhnika Poluprovodnikov, 51:8 (2017), 1105–1109
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Growth of silicon nanoclusters in thermal silicon dioxide under annealing in an atmosphere of nitrogen
Fizika i Tekhnika Poluprovodnikov, 50:6 (2016), 807–810
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Kinetics of phosphorus solid solution decomposition in diffused $\mathrm{Si}$ layers
Fizika Tverdogo Tela, 31:10 (1989), 182–188
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Low temperature structural instability of the high $T_{c}$ superconductor $\mathrm{YBa}_{2}\mathrm{Cu}_{3}\mathrm{O}_{7-x}$
Fizika Tverdogo Tela, 30:7 (1988), 2052–2057
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Complex-formation at phosphorus diffusion into silicon
Fizika Tverdogo Tela, 26:2 (1984), 632–634
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