Vinogradov Andrey Yakovlevich

Publications in Math-Net.Ru

1. High-frequency magnetron sputtering and morphological properties of carbon nanowalls
   
   Zhurnal Tekhnicheskoi Fiziki, 95:2 (2025),  281–287
2. Crystallization and silicon carbide formation in two-layer amorphous silicon-carbon films during electron irradiation
   
   Zhurnal Tekhnicheskoi Fiziki, 92:11 (2022),  1705–1710
3. LED structures based on ZnO films obtained by RF magnetron sputtering for the UV spectral range
   
   Zhurnal Tekhnicheskoi Fiziki, 90:3 (2020),  456–461
4. Parameters of ZnO semiconductor films doped with Mn and Fe 3$d$ impurities
   
   Fizika i Tekhnika Poluprovodnikov, 54:1 (2020),  18–21
5. A carbon nanostructure for a thermoelectric generator
   
   Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:7 (2019),  33–35
6. Influence of silver and gold nanoparticles and thin layers on charge carrier generation in InGaN/GaN multiple quantum well structures and crystalline zinc oxide films
   
   Zhurnal Tekhnicheskoi Fiziki, 88:4 (2018),  566–571
7. Formation of luminescence spectra and emission intensity in the UV and visible spectral regions for $n$-ZnO/$p$-GaN and $n$-ZnO/$p$-ZnO structures when depositing ZnO films by high-frequency magnetron sputtering
   
   Fizika i Tekhnika Poluprovodnikov, 52:10 (2018),  1115–1119
8. Structure and properties of thin graphite-like films produced by magnetron-assisted sputtering
   
   Fizika i Tekhnika Poluprovodnikov, 52:7 (2018),  775–781
9. Parameters of ZnO films with $p$-type conductivity deposited by high-frequency magnetron sputtering
   
   Fizika i Tekhnika Poluprovodnikov, 51:5 (2017),  588–593
10. The effect of diborane additive on the plasma-chemical properties of deposited carbon films
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 43:1 (2017),  80–88
11. UV and IR emission intensity in ZnO films, nanorods, and bulk single crystals doped with Er and additionally introduced impurities
    
    Fizika i Tekhnika Poluprovodnikov, 50:10 (2016),  1325–1332
12. On the possibility of using exoelectron emission for amorphous silicon film band structure analysis
    
    Fizika Tverdogo Tela, 31:1 (1989),  102–105