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Publications in Math-Net.Ru
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Enhancement of the basal-plane stacking fault emission in GaN planar nanowire microcavity
Pis'ma v Zh. Èksper. Teoret. Fiz., 115:10 (2022), 611–612
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Initial stages of growth of semipolar AlN on a nanopatterned Si(100) substrate
Fizika i Tekhnika Poluprovodnikov, 55:10 (2021), 908–911
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Formation of semipolar III-nitride layers on patterned Si(100) substrates with a self-forming nanomask
Fizika i Tekhnika Poluprovodnikov, 55:4 (2021), 356–359
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Calculation of the Ga+ FIB ion dose distribution by SEM image
Fizika i Tekhnika Poluprovodnikov, 54:12 (2020), 1390
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Strong coupling of excitons in hexagonal GaN microcavities
Fizika i Tekhnika Poluprovodnikov, 54:1 (2020), 85–88
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Vapor-phase epitaxy of AlN layers on AlN/Si(111) templates synthesized by reactive magnetron sputtering
Pisma v Zhurnal Tekhnicheskoi Fiziki, 46:8 (2020), 29–31
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GaN selective epitaxy in sub-micron windows with different depths formed by ion beam nanolithography
Fizika Tverdogo Tela, 61:12 (2019), 2333
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Properties of semipolar GaN grown on a Si(100) substrate
Fizika i Tekhnika Poluprovodnikov, 53:7 (2019), 1006–1009
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Epitaxy of GaN(0001) and GaN(10$\bar1$1) layers on Si(100) substrate
Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:11 (2019), 3–5
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Selective epitaxial growth of III–N structures using ion-beam nanolithography
Fizika i Tekhnika Poluprovodnikov, 52:10 (2018), 1237–1243
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Concentric hexagonal GaN structures for nanophotonics, fabricated by selective vapor-phase epitaxy with ion-beam etching
Fizika i Tekhnika Poluprovodnikov, 52:7 (2018), 816–818
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Semipolar gan layers grown on nanostructured Si(100) substrate
Pisma v Zhurnal Tekhnicheskoi Fiziki, 44:12 (2018), 45–51
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InGaN/GaN light-emitting diode microwires of submillimeter length
Fizika i Tekhnika Poluprovodnikov, 51:1 (2017), 101–104
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