Valiev Kamil' Akhmetovich

Publications in Math-Net.Ru

1. Quantum computers and quantum computations
   
   UFN, 175:1 (2005),  3–39
2. Quantum computers: can they be made 'large'?
   
   UFN, 169:6 (1999),  691–694
3. Modellinc and optimization of the optical schemes of the photolithography systems
   
   Matem. Mod., 2:1 (1990),  56–75
4. Influence of spatial coherence of laser radiation on the quality of images in a projection system with a Köhler-type fly's eye illuminator
   
   Kvantovaya Elektronika, 17:4 (1990),  512–516
5. Investigation of the characteristics of an excimer laser with a narrow emission line
   
   Kvantovaya Elektronika, 17:1 (1990),  43–45
6. Synthetic data for inverse seismic problems
   
   Dokl. Akad. Nauk SSSR, 309:2 (1989),  311–314
7. The procedure of reserved image formation under the impulse laser exhibit of positive VUV resitor of the base of polymethylmethacrylate sensitized by anthracene, and its kinetics
   
   Matem. Mod., 1:12 (1989),  44–51
8. A method of data processing for the interferometric control of dissolution of resist film
   
   Matem. Mod., 1:2 (1989),  160–164
9. ELECTRON-BEAM METHOD OF TRANSFER OF A PATTERN DRAWING WITH APPROXIMATELY-0,1-MU-M ELEMENTS ON SEMICONDUCTING PLATES
   
   Pisma v Zhurnal Tekhnicheskoi Fiziki, 15:17 (1989),  55–57
10. Application of metal resinate films in electron- and photolithography
    
    Dokl. Akad. Nauk SSSR, 294:6 (1987),  1358–1362
11. DETERMINATION OF PROJECTED ION FLOW IN POLYMER RESISTS
    
    Zhurnal Tekhnicheskoi Fiziki, 57:9 (1987),  1858–1860
12. PORE FORMATION IN THE POLYMETHYLMETHACRYLATE IN THE X-RAY EXPOSING PROCESS
    
    Zhurnal Tekhnicheskoi Fiziki, 57:7 (1987),  1445–1448
13. Ultraviolet-radiation effect on water-solubility of polymer-films
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 13:24 (1987),  1473–1476
14. Transport of soft-x-ray emission along the optical light-guide
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 13:5 (1987),  257–260
15. Coherence of XeCl laser radiation
    
    Kvantovaya Elektronika, 14:6 (1987),  1266–1268
16. MECHANISM OF THE POLYMER FILM ETCHING IN THE LOW-TEMPERATURE PLASMA
    
    Zhurnal Tekhnicheskoi Fiziki, 56:7 (1986),  1329–1335
17. Direct photo etching of polymers under conditions of macromolecule chain unzipping
    
    Dokl. Akad. Nauk SSSR, 280:5 (1985),  1106–1110
18. High-voltage electron lithography through the pattern former
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 11:17 (1985),  1048–1053
19. Nanosecond single-pulsive laser lithography
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 11:17 (1985),  1025–1030
20. Characteristics of the use of pulsed ultraviolet lasers in photolithography
    
    Kvantovaya Elektronika, 12:12 (1985),  2498–2501
21. PHOTOETCHING OF PRELIMINARY IRRADIATED POLYMER-FILMS
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 10:10 (1984),  577–581
22. DOSIMETRY OF SOFT-X-RAY RADIATION AND VACUUM ULTRAVIOLET, BASED ON THE PHOTOETCHING EFFECT
    
    Zhurnal Tekhnicheskoi Fiziki, 53:3 (1983),  583–585
23. Использование скользящего разряда для размерной обработки тонких полимерных слоев ВУФ фототравлением
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 9:16 (1983),  990–994
24. Present-day semiconductor microelectronics and the prospects of its development
    
    UFN, 109:4 (1973),  765–768
25. Rotational Brownian motion
    
    UFN, 109:1 (1973),  31–64


26. Kev Minullinovich Salikhov (on his seventieth birthday)
    
    UFN, 176:11 (2006),  1243–1244
27. Stanislav Vasil'evich Emel'yanov (A Tribute in Honor of His 75th Birthday)
    
    Differ. Uravn., 40:5 (2004),  579–581
28. In memory of Vladimir Markovich Eleonskii
    
    UFN, 173:4 (2003),  457–458
29. Georgii Viktorovich Skrotskii (Obituary)
    
    UFN, 162:12 (1992),  175–178
30. Aleksandr Mikhailovich Prokhorov (On his seventieth birthday)
    
    UFN, 149:3 (1986),  577–578
31. Semen Aleksandrovich Al'tshuler (Obituary)
    
    UFN, 141:3 (1983),  559–560
32. Semen Aleksandrovich Al'tshuler (on his seventieth birthday)
    
    UFN, 135:3 (1981),  525–526