|
|
Publications in Math-Net.Ru
-
Forming-free memristors based on hafnium oxide processed in electron cyclotron resonance hydrogen plasma
Pis'ma v Zh. Èksper. Teoret. Fiz., 115:2 (2022), 89–93
-
Multiphonon ionization of deep centers in amorphous boron nitride
Pis'ma v Zh. Èksper. Teoret. Fiz., 114:7 (2021), 498–501
-
Optical and electrochromic properties of thin films of ambipolar polyimides with pendant groups based on thioxanthenone derivatives
Optics and Spectroscopy, 129:11 (2021), 1393–1399
-
Atomic structure and optical properties of plasma enhanced chemical vapor deposited SiCOH Low-k dielectric film
Optics and Spectroscopy, 129:5 (2021), 618
-
Optical properties of (ZrO$_{2}$)$_{1-x}$(Y$_{2}$O$_{3}$)$_{x}$ ($x$ = 0–0.037) crystals grown by directional crystallization of the melt
Optics and Spectroscopy, 128:12 (2020), 1830–1836
-
Optical properties of thin films of SiO$_{x}$ $(x<2)$, obtained by exposure of thermal silicon dioxide in hydrogen plasma
Optics and Spectroscopy, 128:10 (2020), 1467–1472
-
Nanoscale potential fluctuations in SiO$_{x}$ synthesized by the plasma enhanced chemical vapor deposition
Fizika Tverdogo Tela, 61:12 (2019), 2528–2535
-
Structure of Hf$_{0.9}$La$_{0.1}$O$_2$ ferroelectric films obtained by the atomic layer deposition
Pis'ma v Zh. Èksper. Teoret. Fiz., 109:2 (2019), 112–117
-
Optical properties of nonstoichiometric silicon oxide SiO$_{x}$ ($x<$ 2)
Optics and Spectroscopy, 127:5 (2019), 769–773
-
The evolution of the conductivity and cathodoluminescence of the films of hafnium oxide in the case of a change in the concentration of oxygen vacancies
Fizika Tverdogo Tela, 60:10 (2018), 2006–2013
-
Atomic and electronic structures of metal-rich noncentrosymmetric ZrO$_x$
Pis'ma v Zh. Èksper. Teoret. Fiz., 108:4 (2018), 230–235
-
Electronic structure of amorphous SiO$_{x}$ with variable composition
Pis'ma v Zh. Èksper. Teoret. Fiz., 108:2 (2018), 114–118
-
Electronic structure of oxygen vacancies in the orthorhombic noncentrosymmetric phase Hf$_{0.5}$Zr$_{0.5}$O$_2$
Pis'ma v Zh. Èksper. Teoret. Fiz., 107:1 (2018), 62–67
-
Optical properties of nonstoichiometric tantalum oxide TaO$_{x}$ ($x<$ 5/2) according to spectral-ellipsometry and Raman-scattering data
Optics and Spectroscopy, 124:6 (2018), 777–782
-
Short-range order and charge transport in SiO$_{x}$: experiment and numerical simulation
Pisma v Zhurnal Tekhnicheskoi Fiziki, 44:12 (2018), 81–88
-
Local oscillations of silicon–silicon bonds in silicon nitride
Pisma v Zhurnal Tekhnicheskoi Fiziki, 44:10 (2018), 37–45
-
Relaxation of the electric current in Si$_{3}$N$_{4}$: Experiment and numerical simulation
Fizika Tverdogo Tela, 59:1 (2017), 49–53
-
Hot electrons in silicon oxide
UFN, 187:9 (2017), 971–979
-
Si-Si bond as a deep trap for electrons and holes in silicon nitride
Pis'ma v Zh. Èksper. Teoret. Fiz., 103:3 (2016), 189–193
-
Charge transport mechanism in thin films of amorphous and ferroelectric Hf$_{0.5}$Zr$_{0.5}$O$_2$
Pis'ma v Zh. Èksper. Teoret. Fiz., 102:8 (2015), 610–614
-
Transport mechanisms of electrons and holes in dielectric films
UFN, 183:10 (2013), 1099–1114
-
Electronic structure of silicon nitride
UFN, 182:5 (2012), 531–541
-
Application and electronic structure of high-permittivity dielectrics
UFN, 180:6 (2010), 587–603
-
Multiphonon mechanism of the ionization of traps in Al$_2$O$_3$Experiment and numerical simulation
Pis'ma v Zh. Èksper. Teoret. Fiz., 89:10 (2009), 599–602
-
Structure of silicon/oxide and nitride/oxide interfaces
UFN, 179:9 (2009), 921–930
-
Atomic structure of the amorphous nonstoichiometric silicon oxides and nitrides
UFN, 178:7 (2008), 727–737
-
Electronic structure of $\alpha$-Al$_2$O$_3$: ab initio simulations and comparison with experiment
Pis'ma v Zh. Èksper. Teoret. Fiz., 85:3 (2007), 197–201
-
Two-band conductivity of ZrO2 synthesized by molecular beam epitaxy
Pis'ma v Zh. Èksper. Teoret. Fiz., 81:11 (2005), 721–723
-
Multiphonon ionization of deep centers in amorphous silicon nitride: Experiment and numerical simulations
Pis'ma v Zh. Èksper. Teoret. Fiz., 77:7 (2003), 455–458
-
Electronic structure of $\mathrm{Si}$–$\mathrm{H}$ and $\mathrm{N}$–$\mathrm{H}$ bonds in $\alpha$-$\mathrm{SiN}_{x}:\mathrm{H}$
Fizika Tverdogo Tela, 34:8 (1992), 2424–2430
-
Shift of the absorption
edge in irradiated amorphous silicon nitride
Dokl. Akad. Nauk SSSR, 287:6 (1986), 1381–1383
-
Multiphonon capture and radiative transitions in $\alpha$-$\mathrm{Si}_{3}\mathrm{N}_{4}$
Fizika Tverdogo Tela, 28:10 (1986), 3239–3242
-
Electron structure of amorphous $\mathrm{Si}_{3}\mathrm{N}_{4}$
Fizika Tverdogo Tela, 26:6 (1984), 1685–1690
-
Cathodoluminescence of amorphous $\mathrm{Si}_{3}\mathrm{N}_{4}$
Fizika Tverdogo Tela, 25:5 (1983), 1560–1562
© , 2024