Publications in Math-Net.Ru
-
Influence of aluminum doping degree on the properties of titanium-aluminum oxide films
PFMT, 2023, no. 2(55), 74–82
-
Peculiarity of reactive magnetron deposition of tantalum oxide films with different methods of gas supply into the chamber
PFMT, 2022, no. 3(52), 97–104
-
Formation of tantalum oxide films on substrates with a diameter of 200 mm
PFMT, 2020, no. 1(42), 12–17
-
Dielectric properties of tantalum oxide thin films deposited by reactive magnetron sputtering
PFMT, 2019, no. 2(39), 15–20
-
Ferroelectric properties of strontium-bismuth tantalate thin film deposited by RF magnetron sputtering method
PFMT, 2018, no. 1(34), 33–37
-
Ferroelectric properties of niobium-doped strontium bismuth tantalate films
Fizika Tverdogo Tela, 58:1 (2016), 51–55
-
Formation of titanium nitride films by reactive magnetron sputtering under low pressure
PFMT, 2016, no. 2(27), 12–17
-
Prediction of targets erosion in magnetron sputtering systems
PFMT, 2010, no. 2(3), 62–67
© , 2024