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Publications in Math-Net.Ru
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Absorption spectra and mechanical properties of C : F nanocoatings deposited from laser plasma onto leucosapphire surface
Kvantovaya Elektronika, 52:4 (2022), 376–381
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Synthesis of fluorocarbon nanofilms on titanium using high-power KrF laser radiation
Kvantovaya Elektronika, 50:12 (2020), 1173–1178
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Properties of polyimide film after electron beam irradiation with a dose of 1 GGy
Optics and Spectroscopy, 126:3 (2019), 280–284
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Formation of a carbon nanofilm on oil-coated KU-1 glass annealed by KrF laser radiation
Kvantovaya Elektronika, 48:2 (2018), 136–144
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Annealing of induced absorption in quartz glasses by ArF laser radiation
Kvantovaya Elektronika, 40:9 (2010), 804–810
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Individual induced absorption bands in MgF2
Kvantovaya Elektronika, 38:3 (2008), 251–257
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Effect of KrF laser radiation on electron-beam-induced absorption in fluorite and quartz glasses
Kvantovaya Elektronika, 37:8 (2007), 711–715
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Radiation resistance of optical materials for windows of UV and VUV excimer lasers
Kvantovaya Elektronika, 37:8 (2007), 706–710
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Nonlinear absorption in optical materials at a wavelength of 193 nm
Kvantovaya Elektronika, 34:2 (2004), 147–150
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Mechanisms of nonlinear absorption of UV laser radiation in CaF2
Kvantovaya Elektronika, 32:4 (2002), 344–348
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Modelling of processes responsible for nonlinear absorption of UV laser radiation in ionic crystals
Kvantovaya Elektronika, 30:8 (2000), 703–709
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Nonlinear absorption and optical strength of BaF2 and Al2O3 at the wavelength of 248 nm
Kvantovaya Elektronika, 29:2 (1999), 141–144
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Electron-beam-induced absorption of ArF, KrF, and XeF laser radiation in optical materials
Kvantovaya Elektronika, 22:7 (1995), 745–748
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Optical breakdown of quartz glass by XeF laser radiation
Kvantovaya Elektronika, 21:4 (1994), 329–332
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Electron-beam-induced absorption of laser radiation at λ = 193, 248, and 353 nm in quartz glass
Kvantovaya Elektronika, 20:11 (1993), 1077–1080
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Absorption induced in KrF laser windows by ionizing radiation
Kvantovaya Elektronika, 18:11 (1991), 1364–1366
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Optical breakdown of fluoride crystals by KrF laser radiation with λ = 248 nm
Kvantovaya Elektronika, 16:6 (1989), 1238–1240
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Operation of a KrF electron-beam laser at high specific excitation powers and energies
Kvantovaya Elektronika, 15:2 (1988), 276–282
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Optical strength of the surfaces of optical materials and mirrors at wavelengths of 248 and 193 nm
Kvantovaya Elektronika, 13:10 (1986), 2141–2144
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Electron-beam-excited ArF laser
Kvantovaya Elektronika, 13:8 (1986), 1730–1733
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Electron-beam XeCl laser with a specific output energy of 20 J/liter
Kvantovaya Elektronika, 12:8 (1985), 1607–1611
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Investigation of dye lasers excited by high-power KrF laser radiation
Kvantovaya Elektronika, 11:7 (1984), 1389–1393
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High-efficiency electron-beam-excited KrF excimer laser
Kvantovaya Elektronika, 10:10 (1983), 2048–2053
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XeF* visible laser with selective optical excitation
Kvantovaya Elektronika, 10:3 (1983), 647–649
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Electron-beam-excited KrF laser with a pump power density of 1.6 GW·liter–1·atm–1
Kvantovaya Elektronika, 8:6 (1981), 1235–1240
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