Publications in Math-Net.Ru
-
Gas-dynamic sources of cluster ions for basic and applied research
UFN, 192:7 (2022), 722–753
-
Influence of the charge state of xenon ions on the depth distribution profile upon implantation into silicon
Fizika i Tekhnika Poluprovodnikov, 53:8 (2019), 1030–1036
-
In situ modification and analysis of the composition and crystal structure of a silicon target by ion-beam methods
Zhurnal Tekhnicheskoi Fiziki, 88:12 (2018), 1900–1907
-
Study of the distribution profile of iron ions implanted into silicon
Fizika i Tekhnika Poluprovodnikov, 51:6 (2017), 778–782
-
Polishing superhard material surfaces with gas-cluster ion beams
Pisma v Zhurnal Tekhnicheskoi Fiziki, 43:2 (2017), 18–23
-
Implantation of high-energy ions produced by femtosecond laser pulses
Kvantovaya Elektronika, 35:1 (2005), 33–37
© , 2024