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ЖУРНАЛЫ // Наносистемы: физика, химия, математика // Архив

Наносистемы: физика, химия, математика, 2013, том 4, выпуск 6, страницы 816–822 (Mi nano820)

Electrical properties of hot wall deposited PbTe–SnTe thin films

V. A. Ivanova, V. F. Gremenoka, H. G. Seidia, S. P. Ziminb, E. S. Gorlachevb

a State Scientific and Production Association "Scientific-Practical Materials Research Centre of the National Academy of Sciences of Belarus", P. Brovka Street 19, 220072 Minsk, Belarus
b Yaroslavl State University, Sovetskaya Street 14, 150000 Yaroslavl, Russia

Аннотация: Polycrystalline Pb$_{1-x}$Sn$_{x}$Te ($0.0\le x\le 1.0$) telluride alloys were synthesized by the direct fusion technique. Thin films of these materials were prepared by a hot wall deposition method on glass substrates at T$_{sub}$ =230–330$^\circ$ C and in a vacuum of about 10$^{-5}$ Torr. The microstructure of the films was characterized by XRD, SEM, EDX and AES. The films showed a natural cubic structure. The thin films' microstructure consisted of densely packed grains with dimensions of 50–300 nm and crystallite growth direction is perpendicular to substrate plane. The asgrown Pb$_{1-x}$Sn$_{x}$Te films showed p-type conductivity. Thermoelectric measurements of the films showed high values for the room-temperature Seebeck coefficient ranging, from 20 to 400 $\mu$V $\cdot$ K$^{-1}$, for SnTe to PbTe thin films, respectively. The conductivity of the films was in the range of 3 $\cdot$ 10$^{1}$–1 $\cdot$ 10$^{4}$ $\Omega^{-1}\cdot$ cm$^{-1}$.

Ключевые слова: hot wall deposition, electrical properties, thin films.

PACS: 73.50.-h

Язык публикации: английский



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