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ЖУРНАЛЫ // Физика и техника полупроводников // Архив

Физика и техника полупроводников, 2015, том 49, выпуск 10, страницы 1407–1410 (Mi phts7419)

Эта публикация цитируется в 4 статьях

Физика полупроводниковых приборов

Comparative Investigation of InGaP/GaAs/GaAsBi and InGaP/GaAs Heterojunction Bipolar Transistors

Yi-Chen Wua, Jung-Hui Tsaib, Te-Kuang Chianga, Fu-Min Wanga

a Department of Electrical Engineering, National University of Kaohsiung, 700, Kaohsiung University Rd., 811 Kaohsiung, Taiwan
b Department of Electronic Engineering, National Kaohsiung Normal University, 802 Kaohsiung, Taiwan

Аннотация: In this article the characteristics of In$_{0.49}$Ga$_{0.51}$P/GaAs/GaAs$_{0.975}$Bi$_{0.025}$ and In$_{0.49}$Ga$_{0.51}$P/GaAs heterojunction bipolar transistor (HBTs) are demonstrated and compared by two-dimensional simulated analysis. As compared to the traditional InGaP/GaAs HBT, the studied InGaP/GaAs/GaAsBi HBT exhibits a higher collector current, a lower base-emitter $(B-E)$ turn-on voltage, and a relatively lower collector-emitter offset voltage of only 7 mV. Because the more electrons stored in the base is further increased in the InGaP/GaAs/GaAsBi HBT, it introduces the collector current to increase and the $B$$E$ turn-on voltage to decrease for low input power applications. However, the current gain is slightly smaller than the traditional InGaP/GaAs HBT attributed to the increase of base current for the minority carriers stored in the GaAsBi base.

Поступила в редакцию: 04.02.2015
Принята в печать: 16.03.2015

Язык публикации: английский


 Англоязычная версия: Semiconductors, 2015, 49:10, 1361–1364

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