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ЖУРНАЛЫ // Физика и техника полупроводников // Архив

Физика и техника полупроводников, 2013, том 47, выпуск 3, страницы 399–403 (Mi phts7861)

Эта публикация цитируется в 1 статье

Изготовление, обработка, тестирование материалов и структур

Influence of the doping with third group oxides on the properties of zinc oxide thin films

Sowmya Palimar, Kasturi V. Bangera, G. K. Shivakumar

Thin Film Laboratory, Physics Department, National Institute of Technology Karnataka, Surathkal-575025, Karnataka, India

Аннотация: The study of modifications in structural, optical and electrical properties of vacuum evaporated zinc oxide thin films on doping with III group oxides namely aluminum oxide, gallium oxide and indium oxide are reported. It was observed that all the films have transmittance ranging from 85 to 95%. The variation in optical properties with dopants is discussed. On doping the film with III group oxides, the conductivity of the films showed an excellent improvement of the order of 10$^3$ $\Omega^{-1}$ cm$^{-1}$. The measurements of activation energy showed that all three oxide doped films have 2 donor levels below the conduction band.

Поступила в редакцию: 22.02.2012
Принята в печать: 10.04.2012

Язык публикации: английский


 Англоязычная версия: Semiconductors, 2013, 47:3, 422–426

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