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ЖУРНАЛЫ // Физика и техника полупроводников // Архив

Физика и техника полупроводников, 2013, том 47, выпуск 10, страницы 1320–1322 (Mi phts8032)

Эта публикация цитируется в 2 статьях

Полупроводниковые структуры, низкоразмерные системы, квантовые явления

The analysis of leakage current in MIS Au/SiO$_2$/$n$-GaAs at room temperature

H. Altuntasa, S. Ozcelikb

a Department of Physics, Faculty of Science, Cankiri Karatekin University, 18100 Cankiri, Turkey
b Department of Physics, Faculty of Science, Gazi University, 06500 Ankara, Turkey

Аннотация: The aim of this study is to determine the reverse-bias leakage current conduction mechanisms in Au/SiO$_2$/$n$-GaAs metal–insulator–semiconductor type Schottky contacts. Reverse-bias current-voltage measurements (I–V) were performed at room temperature. The using of leakage current values in SiO$_2$ at electric fields of 1.46–3.53 MV/cm, $\ln(J/E)$ vs. $\sqrt{(E)}$ graph showed good linearity. From this plot, dielectric constant of SiO$_2$ was calculated as 3.7 and this value is perfect agreement with 3.9 which is value of SiO$_2$ dielectric constant. This indicates, Poole–Frenkel type emission mechanism is dominant in this field region. On the other hand, electric fields between 0.06–0.73 and 0.79–1.45 MV/cm, dominant leakage current mechanisms were found as ohmic type conduction and space charge limited conduction, respectively.

Поступила в редакцию: 14.05.2012
Принята в печать: 25.02.2013

Язык публикации: английский


 Англоязычная версия: Semiconductors, 2013, 47:10, 1308–1311

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