Erratum to: “Dynamics of induced base layer formation in tunnel MIS-transistors under strong electric fields”

S. V. Belov, E. V. Ostroumova, E. A. Rogacheva

Ioffe Physical Technical Institute, Russian Academy of Sciences, St. Petersburg, 194021 Russia

Язык публикации: английский

 Англоязычная версия: Technical Physics Letters, 2015, 41:4, 409